Industrial photoresist development with the EUV laboratory exposure tool : mask fabrication, sensitivity and contrast

SPIE (2019) [Contribution to a book, Contribution to a conference proceedings]

International Conference on Extreme Ultraviolet Lithography 2019 / Editor(s): Toshiro Itani, Paolo A. Gargini, Patrick P. Naulleau, Kurt G. Ronse
Page(s): 9 Seiten

Authors

Selected Authors

Brose, Sascha
Danylyuk, Serhiy
Grüneberger, Franziska
Gerngroß, Maik
Stollenwerk, Jochen Hugo

Other Authors

Schirmer, Matthias
Loosen, Peter

Identifier