Spectroscopic reflectometry in the EUV for critical dimension metrology

Bellingham, Washington, USA / SPIE (2019) [Contribution to a book, Contribution to a conference proceedings]

Metrology, Inspection, and Process Control for Microlithography XXXIII : 25-28 February 2019, San Jose, California, Unites States / Vladimir A. Ukraintsev, Ofer Adan (editors) ; sponsored by: SPIE
Page(s): 6 Seiten


Selected Authors

Bahrenberg, Lukas
Danylyuk, Serhiy
Michels, Robert
Glabisch, Sven
Ghafoori, Moein

Other Authors

Brose, Sascha
Stollenwerk, Jochen Hugo
Loosen, Peter