EUV actinic mask blank defect inspection: results and status of concept realization

Bellingham, Wa / SPIE (2011) [Beitrag zu einem Tagungsband]

27th European Mask and Lithography Conference : 18 - 19 January 2011, Dresden, Germany / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed.
Seite(n): 79850C, 8 S.

Autorinnen und Autoren

Autorinnen und Autoren

Maryasov, Aleksey
Herbert, Stefan
Juschkin, Larissa
Lebert, Rainer
Bergmann, Klaus